Self-Diffusion in Silicon Nitride.
Interim rept. 1 Jan-31 Dec 73,
AVCO SYSTEMS DIV WILMINGTON MASS
Pagination or Media Count:
Progress is described in the first year of a program designed to obtain simultaneous measurement of Si and N self-diffusion coefficients in silicon nitride. Comparative measurements will be made at a given temperature in a variety of materials. Measurements will also be made as a function of temperature for one well characterized material. Neither Si nor N has an isotope suitable for use as a radiotracer. The stable isotopes Si29 and N15 are therefore being used as tracers. Mass spectrometry applied to sections removed serially from a sample will be used to establish isotope distributions. Determination of N15N14 is being obtained from N2 using gas spectrometry measurement of Si29Si30 is being determined from BaSiF6 with hot filament analysis. Modified author abstract
- Ceramics, Refractories and Glass
- Atomic and Molecular Physics and Spectroscopy