Accession Number:

AD0772677

Title:

Electron Beam Microanalysis of Electrochemical Attack on Thin Film Nickel-Chromium Resistors

Descriptive Note:

Technical rept.

Corporate Author:

ROME AIR DEVELOPMENT CENTER GRIFFISS AFB NY

Personal Author(s):

Report Date:

1973-10-01

Pagination or Media Count:

39.0

Abstract:

The purpose of the report is to present the results of the electron beam microanalysis EBM studies which have led to the development of a model for the observed electrochemical reaction. The intent was to correlate, principally through use of an electron microprobe, the various chemical characteristics of the integrated circuit with the behavior of thin film nickel-chromium resistors. Other pertinent features of the devices were studied with several additional techniques including scanning electron microscopy and mass spectrometry.

Subject Categories:

  • Electrical and Electronic Equipment

Distribution Statement:

APPROVED FOR PUBLIC RELEASE