Electron Beam Microanalysis of Electrochemical Attack on Thin Film Nickel-Chromium Resistors
ROME AIR DEVELOPMENT CENTER GRIFFISS AFB NY
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The purpose of the report is to present the results of the electron beam microanalysis EBM studies which have led to the development of a model for the observed electrochemical reaction. The intent was to correlate, principally through use of an electron microprobe, the various chemical characteristics of the integrated circuit with the behavior of thin film nickel-chromium resistors. Other pertinent features of the devices were studied with several additional techniques including scanning electron microscopy and mass spectrometry.
- Electrical and Electronic Equipment