A 1 KeV Ion Probe for Thin Film Analysis.
AIR FORCE INST OF TECH WRIGHT-PATTERSON AFB OHIO SCHOOL OF ENGINEERING
Pagination or Media Count:
A 1 KeV ion probe analyzer was designed and assembled for thin film analysis. The major components include a QUAD 25OB quadrupole mass spectrometer manufactured by Electronic Associates, Inc., and a Phi 04-131 sputter ion gun manufactured by Physical Electronics Industries, Inc. The distinctive features of the analyzer are its low energy ion source and its ability to sputter and analyze conducting and nonconducting materials equally well. The instrument can resolve impurity densities of one part in 1000 from sputtered secondary ions, and the etch rate achieved is 800 angstroms per hour on a permalloy target. The report contains sample spectra and the necessary details to use it as an operating manual for the analyzer. Recommendations include modifications for improved sensitivity, establishment of measurement standards, and further work for time-of-flight and ion energy measurements. Author
- Test Facilities, Equipment and Methods