Accession Number:

AD0766569

Title:

Features of Element Distribution in the Diffusion Layers of a Three-Component System Based on Titanium,

Descriptive Note:

Corporate Author:

FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO

Personal Author(s):

Report Date:

1973-08-16

Pagination or Media Count:

9.0

Abstract:

In this paper an attempt has been made to establish the influence of a third element when there is a slight content of it in titanium and vandium 1-3 wt. percent on their mutual diffusion and the distribution of elements in the diffusion layer. As the third element aluminum and tin were selected, since they increase the stability of a low-temperature hexagonal close-packed GPU modification of titanium alpha-stabilizers, and molybdenum, which, like vanadium, increases the stability of high-temperature face-centered cubic OTsK modification of titanium beta-stabilizers. Author

Subject Categories:

  • Metallurgy and Metallography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE