Accession Number:

AD0760118

Title:

Investigation of the Properties of Thin Insulating Films Deposited with an Ion Beam System.

Descriptive Note:

Final rept. 1 May-31 Jul 72,

Corporate Author:

WHITTAKER CORP WALTHAM MASS SPACE SCIENCES DIV

Personal Author(s):

Report Date:

1973-01-01

Pagination or Media Count:

29.0

Abstract:

A preliminary study is described wherein thin film insulators deposited with a unique ion beam deposition system were investigated for radiation resistance. Metal-insulator-semiconductor structures were fabricated and used to evaluate both an insulating carbon film and ion beam deposited Al2O3 films. I-V and C-V measurements are described for both types of materials for eventual application in field effect devices. These showed little shift in flat-band voltage under irradiation, however, some surface charge effects require further study. Author

Subject Categories:

  • Electrical and Electronic Equipment
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE