Beam Techniques for the Fabrication of Integrated Optics Circuits.
Final rept. 11 Sep 72-31 Jan 73,
HUGHES RESEARCH LABS MALIBU CALIF
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Electron beam lithography and ion beam sputtering have been used to fabricate micron-size waveguides in thermally grown silicon dioxide, in chemical vapor deposited silicon dioxide, and in ion beam sputter- deposited silicon dioxide. In addition, waveguides were made directly in polymethyl methacrylate and the waveguide cross section was demonstrated as controllable using isochronal annealing above the glass- transition temperature 110 C of PMMA. Waveguides with only a few hundred Angstrom edge roughness, were obtained. The factors limiting ultimate smoothness are not fully known, but it does appear from this work that extremely smooth and sufficiently small cross section structures for fundamental mode optical waveguiding can be made by a combination of electron and ion beam microfabrication techniques. Author, modified-PL
- Electrical and Electronic Equipment