Rotation-dependence of the Photoelastic Effect.
COLUMBIA UNIV NEW YORK DEPT OF CIVIL ENGINEERING AND ENGINEERING MECHANICS
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The discovery, by Nelson and Lax, of the rotation-dependence of the photoelastic effect is reviewed in the light of Toupins formula for the reciprocal dielectric susceptibility. The influences of the polarization gradient and a non-primitive crystal structure are also examined. Author
- Solid State Physics