Accession Number:

AD0757129

Title:

On the Amorphization of Si and WO3 by Particle Impact. Studies on Bombardment-induced Disorder, V,

Descriptive Note:

Corporate Author:

MCMASTER UNIV HAMILTON (ONTARIO) INST FOR MATERIALS RESEARCH

Personal Author(s):

Report Date:

1971-06-30

Pagination or Media Count:

6.0

Abstract:

Estimates of the depth of bombardment-induced amorphization R sub a are presently available for seven different ions injected into SiAr, As, B, Ne, P, Sb and Si as well as for Kr injected into WO3. These depths can be interpreted in terms of recent damage-distribution theories to yield F sub dR sub a, the initial displacement fraction at depth R sub a. Here the term initial means present before thermal and athermal annealing. The resulting values of F sub dR sub a were found to be reasonably constant, such that, depending on which theory was used, they had an average of either 0.7 plus or minus 0.2 or 0.4 plus or minus 0.2 for Si and either 0.9 plus or minus 0.03 or 0.17 plus or minus 0.06 for WO3. It is concluded, in view of the constancy of F sub dR sub a, that the amorphization of Si and WO3 can be self-consistently explained by homogeneous damage accumulation. Author Modified Abstract

Subject Categories:

  • Radioactivity, Radioactive Wastes and Fission Products
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE