Conduction Mechanisms in Thick Film Microcircuits
Semi-annual technical rept. 1 Jul-31 Dec 1972
PURDUE RESEARCH FOUNDATION LAFAYETTE IN
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Results from studies of the resistance of RuO2-glass resistors during firing and of the surface tension of the glass are presented, and their correlation with the proposed model for microstructure development discussed. Studies of the removal of the ethyl cellulose - butyl carbitol screening agent led to the conclusion that the last traces of organic matherials cannot be removed below 500C. An investigation of the drying of RuO2 . xH2O employing DTA and TGA techniques is discussed, and a procedure described for preparing auhydrous RuO2 with suitable particle size range.
- Electrical and Electronic Equipment