Chemical Modifications of Silica Surfaces
Final rept. 13 May 1969-12 Nov 1972
NEW YORK UNIV NY DEPT OF CHEMISTRY
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The purpose of the work was to modify the surfaces of silicas by chemical means, i.e. by causing them to react with gaseous or liquid materials under controlled conditions, in order to alter the nature and reactivity of the surfaces. The reactions and the molecular species occurring on the surfaces were monitored by means of infrared spectroscopic techniques. An entirely new type of surface defect has been discovered. The defect has the properties expected for a center consisting of two closely-spaced silicon radicals associated with two anomalously reactive oxygen atoms. The defect responsible for the activity of reactive silica RS is best produced by a methoxylation, pyrolysis, degassing procedure.
- Physical Chemistry