Fabrication and Evaluation of RF Sputtered Barium Titanate Thin Films.
Research and development technical rept.,
ARMY ELECTRONICS COMMAND FORT MONMOUTH N J
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Structural, chemical, dielectric, and ferroelectric limited characteristics of RF sputtered barium titanate BaTiO3 are described. Primary interest was to determine film capability for providing high capacitance devices for hybrid and thin film integrated circuits. The extent of ferroelectric film behavior was also of concern for charge storage use in the development of thin film image plates for miniature solid state facsimile cameras. Metal-dielectric-metal capacitor structures incorporating amorphous or polycrystalline BaTiO3 films were fabricated and evaluated. Author
- Electrical and Electronic Equipment