New Compounds for Use in HF Lasers.
Report for 1 Jul 70-30 Jun 71,
AEROSPACE CORP EL SEGUNDO CALIF LAB OPERATIONS
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A study was conducted to find new F and H containing compounds that would produce lasing in electrically pulsed HF chemical lasers. The emphasis in the study was on seeking economical, safe, and storable chemicals. Spectroscopic analyses of the lasing outputs were made. The compounds included CH3CHF2, NF3, IF5, SF6, PR5, CF4, C3F8, SiF4, SO2F2, and SOF2. Author
- Lasers and Masers