Accession Number:

AD0743656

Title:

Method for Cleaning Semiconductors Surfaces,

Descriptive Note:

Corporate Author:

FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO

Personal Author(s):

Report Date:

1972-04-04

Pagination or Media Count:

7.0

Abstract:

The purpose of the invention is to elaborate the method of cleaning the surface of semiconductors in a hydrogen-containing protective atmosphere, which method could be applied as an independent process or conjointly with another process, e.g., fusion, vaporization, and which should make possible a considerably more effective cleaning of the surface of semiconductors.

Subject Categories:

  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE