Accession Number:

AD0741243

Title:

Study of Dipolar Polarization in Silicon Nitride Films Using an Adapted Thermally Stimulated Current Technique.

Descriptive Note:

Doctoral thesis,

Corporate Author:

ILLINOIS UNIV URBANA COORDINATED SCIENCE LAB

Personal Author(s):

Report Date:

1972-04-01

Pagination or Media Count:

123.0

Abstract:

The thesis is a study of ionic polarization in RF sputtered Si3N4 films by the technique of Thermally Stimulated Current TSC. The model for this polarization phenomenon is a bound ion which may reside in either of two equilibrium potential minima. When an ion moves from one site to the other it behaves as an electric dipole. The TSC procedure consists of 1 biasing the film to establish a non-equilibrium distribution of ions, 2 thermal quenching to freeze the ions in their non-equilibrium state, and 3 reheating the film while measuring the current resulting from the equilibrium of ions in their states. The thesis describes the construction of an RF sputtering system to deposit refractory insulating films as well as a vacuum dewar and automatic temperature programmer for taking TSC data. Author

Subject Categories:

  • Manufacturing and Industrial Engineering and Control of Production Systems
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE