Accession Number:

AD0737596

Title:

Newtonian Limit for Viscosity Measurements of KMER Photoresist Solutions.

Descriptive Note:

Research and development technical rept.,

Corporate Author:

ARMY ELECTRONICS COMMAND FORT MONMOUTH N J

Report Date:

1972-01-01

Pagination or Media Count:

13.0

Abstract:

Rapid measurements of the viscosity of photoresist solutions, that are being performed as part of process control in integrated circuit technology, are usually based on methods, such as the Ostwald-Cannon-Fenske viscometer, which apply only to Newtonian liquids. The present investigation was, therefore, designed to determine the range of dilutions for Kodak Metal-Etch Resist for which the solution becomes non-Newtonian. The results presented indicate that non-Newtonian behavior occurs only at mixtures with thinner concentrations above 10 percent, and that for most photoresist applications, non-Newtonian behavior need not be considered. Author

Subject Categories:

  • Physical Chemistry
  • Electrical and Electronic Equipment
  • Printing and Graphic Arts

Distribution Statement:

APPROVED FOR PUBLIC RELEASE