Accession Number:

AD0731900

Title:

Some Questions of Vacuum Technology during the Deposition of Thin Films,

Descriptive Note:

Corporate Author:

FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO

Personal Author(s):

Report Date:

1971-08-17

Pagination or Media Count:

19.0

Abstract:

The structure and properties of thin films obtained by thermal vaporization in a vacuum are determined to a considerable degree by the conditions of condensation and depend on temperature of vaporization, rate of condensation, and angle of incidence of deposited substance on the base layer nature of the base layer, its degree of purity, and microrelief of the surface the degree of evacuation and the composition of residual gases during condensation. The parameters of the above categories are discussed briefly in this article. The conclusion is that as the change in the properties of films is influenced decisively in many cases not by the absolute magnitude of the vacuum, but by the magnitude of partial pressures of definite gases and vapors, their removal from the working volume by selective evacuation is a simpler and more real solution to the problem of obtaining pure films than the superhigh vacuum. Author

Subject Categories:

  • Metallurgy and Metallography
  • Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE