Accession Number:

AD0725833

Title:

Chemical Vapor Deposition

Descriptive Note:

Semiannual progress rept.

Corporate Author:

UTAH UNIV SALT LAKE CITY DIV OF MATERIALS SCIENCE AND ENGINEERING

Personal Author(s):

Report Date:

1971-05-01

Pagination or Media Count:

23.0

Abstract:

The report discusses the chemical vapor deposition of tungsten on a copper substract using tungsten hexafluoride and hydrogen. The crystal properties of the tungsten are mentioned. Microhardness measurements on material deposited at each of 500 and 700C are reported. The morphologies of the fracture faces for all tests were observed with scanning electron microscopy although no pictures are presented in the report. Square holes have been observed in transmission electron microscopic observations of sections parallel to the growing interface. For W-22 Rh alloy it is now thought that observed grain growth rate decreases at longer annealing times are caused by the development of bubbles on the grain boundaries.

Subject Categories:

  • Properties of Metals and Alloys
  • Fabrication Metallurgy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE