INVESTIGATION OF THE INFLUENCE OF DEFECTS IN THIN METALLIC FILMS ON THEIR OPTICAL AND ELECTRICAL PROPERTIES.
Final technical rept.,
PARIS UNIV (FRANCE) LABORATOIRE D'OPTIQUE
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The purpose of the present work was to determine the optical properties of thin Ag films and to investigate the influence of their crystallographic structure on these properties. The film surfaces were certainly flatter and smoother than the surface of usual optical samples, which is important in order to prevent surface effects. The optical results can be summarized as follows A low value of the optical mass, independent of the film structure, was found 0.87 The optical relaxation time strongly depends on the film structure, and is always smaller than the electrical relaxation time approximately 2 The onset of interband transitions was accurately determined 3.86 eV In some cases a supplementary absorption band was observed, peaking at 1.5 eV, certainly related to the presence of impurity or defects centers, and No displacement of the plasmon frequency at Eta-Omega sub p equal to 3.77 eV with film structure was observed, only a damping of the resonance peak in the energy loss function IM 1e for poor films. Author
- Solid State Physics