Accession Number:

AD0712011

Title:

A DESIGN AND EVALUATION OF AN ION IMPLANTATION SYSTEM

Descriptive Note:

Master's thesis

Corporate Author:

AIR FORCE INST OF TECH WRIGHT-PATTERSON AFB OH SCHOOL OF ENGINEERING

Personal Author(s):

Report Date:

1970-03-01

Pagination or Media Count:

76.0

Abstract:

A machine originally designed as a bakeable, monoenergetic sputtering apparatus was redesigned for use as an ion implantation system. Engineering modifications produced a virtually oil-free high-vacuum system. The base pressure of the system unbaked in its present configuration is 1 x 10 to the minus 8th power Torr. A 0.8-microamperes, 6.5-keV nitrogen ion beam was obtained. The machine, after modifications, was studied to determine its feasibility as an ion implantation system. If beam voltages greater than 10 kV are used, the machine will be suitable to perform small-area implants areas approximately equal to 0.5 sqcm with dopants available in gaseous form non-corrosive ranging in energy from 10 to 30 keV.

Subject Categories:

  • Particle Accelerators
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE