Accession Number:
AD0698108
Title:
VACUUM DEPOSITION OF THIN FILMS,
Descriptive Note:
Corporate Author:
FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO
Personal Author(s):
Report Date:
1969-08-15
Pagination or Media Count:
334.0
Abstract:
The book deals with methods of obtaining and processing thin films, methods of measuring the deposition rate and thickness of thin-film layers, and the main fields of application of thin films. Vacuum requirements and the requirements for the composition of the residual medium in thermal evaporation and cathode sputtering are given, and modern methods of producing and measuring vacuums and the equipment used in obtaining thin films are described. Author
Descriptors:
- (*VAPOR PLATING
- VACUUM APPARATUS)
- (*FILMS
- DEPOSITION)
- STATE OF THE ART REVIEWS
- METAL FILMS
- SEMICONDUCTING FILMS
- DIELECTRIC FILMS
- OPTICAL COATINGS
- SPUTTERING
- SPRAYS
- VACUUM PUMPS
- EVAPORATORS
- THICKNESS
- MANUFACTURING
- INTEGRATED CIRCUITS
- MICROELECTRONICS
- THIN FILM STORAGE DEVICES
- SUPERHIGH FREQUENCY
- MASS SPECTROSCOPY
- SPECTRUM ANALYZERS
- USSR
Subject Categories:
- Manufacturing and Industrial Engineering and Control of Production Systems