EXPERIMENTAL STUDY OF SUPERCONDUCTING THIN-FILM TUNNEL DIODES.
NAVAL CIVIL ENGINEERING LAB PORT HUENEME CALIF
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A vacuum deposition method is described for fabricating superconducting thin-film tunnel diodes which consist of an oxidized aluminum Al film in contact with a lead Pb film. The method produced stable diodes by growing the oxide film in a low-pressure atmosphere of dry oxygen pressure during metal-film deposition was around 0.001 torr. In some of the diodes the superconducting transition temperature of Al was near 2 degrees K. Zero-voltage current was observed in some of the a-c driven diodes, at temperatures below 1.8 degrees K. An experiment was conducted to determine the response of an AlAl2O3Pb superconducting thin-film diode to incoherent submillimeter radiation. Author
- Electrical and Electronic Equipment
- Electricity and Magnetism