Accession Number:

AD0683609

Title:

THE OXIDATION MECHANISM OF NICKEL SILICON ALLOY

Descriptive Note:

Technical rept.

Corporate Author:

WATERVLIET ARSENAL NY BENET WEAPONS LAB

Personal Author(s):

Report Date:

1968-12-01

Pagination or Media Count:

31.0

Abstract:

Thermogravimetric techniques have been used to study oxidation of nickel alloys containing 0.1 to 3.2 wt silicon at temperatures up to 1300C. Due to the appearance of internal oxidation the effect of silicon addition on the oxidation process was complex. The thermograms showed a simple curve for lower silicon content, but two consecutive curves for higher content. The oxidation mechanism was interpreted in terms of isothermal kinetics and the corresponding structural changes.

Subject Categories:

  • Properties of Metals and Alloys

Distribution Statement:

APPROVED FOR PUBLIC RELEASE