Accession Number:

AD0683275

Title:

PHYSICAL BASES OF THE USE OF PLASMA FOR THE GENERATION AND AMPLIFICATION OF SHF OSCILLATIONS,

Descriptive Note:

Corporate Author:

FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO

Report Date:

1968-05-17

Pagination or Media Count:

102.0

Abstract:

Some new methods for amplification and generation of superhigh frequency SHF oscillations using electron-ion plasma penetrated by an electron beam and also using a rotating electron beam are considered. In contrast to the usual SHF devices, where the electron beam interacts with electromagnetic fields which are channeled by metallic structures, in plasma SHF devices plasma having a number of new properties is used as the medium channeling the electromagnetic oscillations. The physical principles in utilizing plasma for the generation and amplification of SHF oscillations and the interactions of plasma oscillations with an electron beam are considered in the first part of the book. The basic properties of the interaction which can be used for constructing plasma amplifiers and oscillators are developed. The results of theoretical and experimental studies of plasma amplifiers and oscillators are presented. In the second part centrifugal-electrostatic focusing CEF of rotating electron beams is considered. New SHF amplifiers and oscillators, constructed on the basis of this focusing and having a number of advantages over other electron SHF devices, are also discussed. The stability of an electron beam when utilizing CEF is analyzed and the current limit is determined. Experimental studies of traveling wave tubes TWT and backward wave tubes BWT with central electrostatic focusing are described. The processes of high frequency bunching in a rotating electron beam are considered in linear and nonlinear approximations and it is shown that space-charge self-bunching of the electrons is possible.

Subject Categories:

  • Electrical and Electronic Equipment

Distribution Statement:

APPROVED FOR PUBLIC RELEASE