A HIGH PURITY REACTION GAS SYSTEM FOR FIELD EMISSION AND IONIZATION MICROSCOPES.
ILLINOIS INST OF TECH CHICAGO DEPT OF METALLURGICAL ENGINEERING
Pagination or Media Count:
A reaction gas system capable of supplying high purity oxygen in the form of a molecular beam to a combined field ion-emission microscope is described. Gas pressure at the emitter could be continuously varied from .001 to 0.000000001 torr. The construction, operation, and calibration of the system are discussed. Also included is a brief discussion of an interrupted time sequence technique used to study oxidation reactions at temperatures from 30 to 900C. Author
- Physical Chemistry
- Metallurgy and Metallography