Accession Number:

AD0681089

Title:

A HIGH PURITY REACTION GAS SYSTEM FOR FIELD EMISSION AND IONIZATION MICROSCOPES.

Descriptive Note:

Technical rept.,

Corporate Author:

ILLINOIS INST OF TECH CHICAGO DEPT OF METALLURGICAL ENGINEERING

Personal Author(s):

Report Date:

1969-01-01

Pagination or Media Count:

17.0

Abstract:

A reaction gas system capable of supplying high purity oxygen in the form of a molecular beam to a combined field ion-emission microscope is described. Gas pressure at the emitter could be continuously varied from .001 to 0.000000001 torr. The construction, operation, and calibration of the system are discussed. Also included is a brief discussion of an interrupted time sequence technique used to study oxidation reactions at temperatures from 30 to 900C. Author

Subject Categories:

  • Physical Chemistry
  • Metallurgy and Metallography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE