Accession Number:
AD0672095
Title:
CHEMICAL VAPOR DEPOSITED MATERIALS FOR ELECTRON TUBES.
Descriptive Note:
Triannual rept. no. 1, 15 Dec 67-14 Apr 68,
Corporate Author:
RAYTHEON CO WALTHAM MASS RESEARCH DIV
Personal Author(s):
Report Date:
1968-06-01
Pagination or Media Count:
54.0
Abstract:
Microwave tests of etched patterns of a conductor on a dielectric substrate have shown that fine-lined, ruled structures can provide slow-wave circuits of the Karpline type when the assembly is uniform over its length. Tests have shown that grid spacers can easily be made of high-density isotropic CVD BN by using an air abrasive unit. Several isotropic CVD BN depositions to fabricate cylindrical microwave windows were made with uniformly good results. Isotropic CVD BN materials with densities both higher and lower than standard isotropic CVD BN were prepared in small quantities. Preliminary measurements have shown that certain of these materials may be more desirable for some applications than standard isotropic CVD BN. High-density isotropic CVD BN can be prepared by reducing reactant concentrations but the deposition rate is low. Increased density, together with increased deposition rate, appears possible with proper control of critical deposition parameters. Good results were obtained with a special metallizing tape 88 ZrH2-12 Ni on boron nitride, but since the air prefiring is critical, this tape technique may be abandoned. Author
Descriptors:
Subject Categories:
- Electrical and Electronic Equipment
- Fabrication Metallurgy
- Miscellaneous Materials