Accession Number:

AD0669053

Title:

A PARAMETRIC STUDY OF THIN FILMS OF TANTALUM-NITROGEN COMPOUNDS.

Descriptive Note:

Technical rept.,

Corporate Author:

AIR FORCE AVIONICS LAB WRIGHT-PATTERSON AFB OHIO

Personal Author(s):

Report Date:

1968-02-01

Pagination or Media Count:

13.0

Abstract:

Thin films of tantalum-nitrogen compounds were deposited by reactive sputtering onto quartz substrates for electrical and optical measurements and onto carbon-coated grids for electron diffraction analysis using hot- and cold-stage techniques. The films were deposited at substrate temperatures varying from room temperature to 500C at sputtering voltages varying from 1 to 5 kV. The relationship between nitrogen content and lattice structure is presented and compared with resistivity and optical absorption measurements. Author

Subject Categories:

  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE