A PARAMETRIC STUDY OF THIN FILMS OF TANTALUM-NITROGEN COMPOUNDS.
AIR FORCE AVIONICS LAB WRIGHT-PATTERSON AFB OHIO
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Thin films of tantalum-nitrogen compounds were deposited by reactive sputtering onto quartz substrates for electrical and optical measurements and onto carbon-coated grids for electron diffraction analysis using hot- and cold-stage techniques. The films were deposited at substrate temperatures varying from room temperature to 500C at sputtering voltages varying from 1 to 5 kV. The relationship between nitrogen content and lattice structure is presented and compared with resistivity and optical absorption measurements. Author
- Solid State Physics