Accession Number:

AD0661960

Title:

CHEMICAL VAPOR DEPOSITION OF HAFNIUM CARBIDE

Descriptive Note:

Technical Report,01 Jan 1966,31 Jul 1967

Corporate Author:

AEROSPACE CORP EL SEGUNDO CA EL SEGUNDO

Personal Author(s):

• Wilcox,W. R.
• Teviotdale,J. R.
• Corley,R. A.

Report Date:

1967-10-25

Pagination or Media Count:

21.0

Abstract:

Chemical vapor deposition of hafnium carbide yielded whiskers, needles, dendrites, faceted crystals, and adherent coatings. The gas stream compositions and the mass transfer conditions determined the habit of deposit. The deposits were obtained at temperatures ranging from 1100 to 1800 deg C.

Descriptors:

• HAFNIUM COMPOUNDS
• CRYSTAL GROWTH
• CARBIDES
• WHISKERS (CRYSTALS)
• VAPOR PLATING
• DOPING
• FILAMENTS
• SINGLE CRYSTALS
• DENDRITIC STRUCTURE
• COATINGS
• REFRACTORY MATERIALS
• chemical vapor deposition

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE