APPLICATION OF THE AUGER PROCESS TO THE STUDY OF GASEOUS ADSORPTION ON TUNGSTEN,
ILLINOIS UNIV URBANA COORDINATED SCIENCE LAB
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Apparatus is described which allows the density of gas adsorbed on metal surfaces to be monitored by observing changes in the number of electrons ejected from the surface by a constant-current, low-energy ion beam. It is shown that the electron emission process an Auger process is temperature independent thus, surface coverages may be easily compared at different temperatures. Adsorption at room temperature and at the temperature of liquid nitrogen was studied by flash filament and Auger techniques. Desorption kinetics of H2, CO, and N2 from polycrystalline, 110, and 111 tungsten foils are discussed.
- Atomic and Molecular Physics and Spectroscopy
- Solid State Physics