QUANTITATIVE HIGH TEMPERATURE INFRARED SPECTROSCOPY.
Final scientific rept., 1 May 65-31 Oct 66,
TECHNION - ISRAEL INST OF TECH HAIFA DEPT OF PHYSICS
Pagination or Media Count:
The statistical band model was successfully applied to the NO fundamental band at 5.3 microns. The temperature range was 300-800K. Pressures between 0 and 5 atm were applied. The temperature dependence of the band model parameters was established and compared to existing theoretical results. Good agreement was obtained in the temperature range studied. Author