ANNUAL REPORT ON SPUTTERING, NOVEMBER 1966.
Rept. for 1 Nov 65-31 Oct 66,
LITTON SYSTEMS INC MINNEAPOLIS MINN APPLIED SCIENCE DIV
Pagination or Media Count:
Relative sputtering yields were determined for variously oriented Ge surfaces above and below the annealing temperature. The yield for Ge100 was found to be higher for an ordered surface than for a damaged surface. The opposite is true in the case of Ge110 and no change was observed for Ge111. Alloy targets were sputtered to determine the amount of sputtering required to reach equilibrium conditions, where material is removed in the same proportions as the bulk. This produces a target surface layer of altered composition. In alloys of 55 Cu and 45 Ni, and of 90 Ni and 10 Ti, it appears that an equivalent of 10-20 atomic layers must be removed before equilibrium conditions are reached at bombarding ion energies of 500-1000 eV. Simultaneous sputtering of two targets with widely different yields produces some puzzling results. Only a small number of atoms from the low yield target, when deposited on the high yield target, produce a surface covered with cones and this results in a sizeable reduction in sputtering yield. A quadrupole mass filter system for analysis of sputtered material has been assembled and tested. Author
- Fabrication Metallurgy