THE EFFECT OF CHEMICAL ADDITIVES ON THE ELECTRON DENSITY OF PLASMA JETS.
Final rept., 1 Dec 62-30 Nov 65,
TUFTS UNIV MEDFORD MASS DEPT OF CHEMICAL ENGINEERING
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Three chemical means for reducing the electron density in a plasma sheath were investigated. These methods were the addition of electrophilic atoms or radicals, the addition of micron size refractory dust particles, and the addition of substances that will undergo an endothermic reaction in the plasma. Several hydrocarbons, sulfur hexafluoride, water vapor, and submicron silicon oxide, aluminum oxide, aluminum and carbon particles were injected into air and nitrogen plasmas at pressures varying between 30 and 2.5 inches Hg. The change in X-band microwave transmission across the plasma was noted. Among all the compounds used, sulfur hexafluoride was found to be the most effective in improving transmission and this was attributed to the presence of highly electrophilic fluorine atoms. It was at least fifteen times as effective as water, on a mole basis, and therefore about twice as effective on a weight basis. Author
- Plasma Physics and Magnetohydrodynamics