THERMODYNAMICS OF THE CHLORINE-HYDROGEN-SILICON SYSTEM.
EXPLOSIVES RESEARCH AND DEVELOPMENT ESTABLISHMENT WALTHAM ABBEY (ENGLAND)
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The equilibrium composition of the gas phase and the weight of silicon deposited were calculated for SiCl4H2 and SiHCl3H2 mixtures at temperatures ranging from 1000 - 2000K and a pressure of one atmosphere. It is shown that many observations made on the rate of epitaxial silicon deposition from SiCl4H2 and SiHCl3H2 mixtures may be explained in terms of thermodynamics alone. Author
- Physical Chemistry