PRODUCTION ENGINEERING MEASURE FOR IMPROVEMENT OF PRODUCTION TECHNIQUE TO INCREASE THE RELIABILITY FOR PNP INTERMEDIATE POWER SILICON PLANAR SWITCHING TRANSISTORS, INCLUDING 2N3502.
Quarterly progress rept. no. 5, 1 Jan-31 Mar 66.
FAIRCHILD SEMICONDUCTOR DIV FAIRCHILD CAMERA AND INSTRUMENT CORP MOUNTAIN VIEW CALIF
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This report describes the completed process for oxidizing wafers in an epitaxial reactor. It includes a discussion of the process techniques and of the effects of thin and thick oxide layers. Life test results on wafers with thin and thick oxides are evaluated. Author
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