Accession Number:

AD0637577

Title:

PRODUCTION ENGINEERING MEASURE FOR IMPROVEMENT OF PRODUCTION TECHNIQUE TO INCREASE THE RELIABILITY FOR PNP INTERMEDIATE POWER SILICON PLANAR SWITCHING TRANSISTORS, INCLUDING 2N3502.

Descriptive Note:

Quarterly progress rept. no. 5, 1 Jan-31 Mar 66.

Corporate Author:

FAIRCHILD SEMICONDUCTOR DIV FAIRCHILD CAMERA AND INSTRUMENT CORP MOUNTAIN VIEW CALIF

Personal Author(s):

• KNUDSEN,J.
• Floyd,D.

Report Date:

1966-03-31

Pagination or Media Count:

18.0

Abstract:

This report describes the completed process for oxidizing wafers in an epitaxial reactor. It includes a discussion of the process techniques and of the effects of thin and thick oxide layers. Life test results on wafers with thin and thick oxides are evaluated. Author

Descriptors:

• *TRANSISTORS
• MANUFACTURING
• RELIABILITY(ELECTRONICS)
• SILICON
• PROCESSING
• OXIDATION
• DISKS
• FILMS
• EPITAXIAL GROWTH
• OXIDES
• CERAMIC COATINGS
• LIFE EXPECTANCY(SERVICE LIFE)

Subject Categories:

• Electrical and Electronic Equipment

Distribution Statement:

APPROVED FOR PUBLIC RELEASE