SILICON, PNP, MEXA TRANSISTOR TYPES JAN 2N328A AND JAN 2N329A.
Quarterly progress pret. no. 2, 1 Mar-29 May 66.
RAYTHEON CO MOUNTAIN VIEW CALIF SEMICONDUCTOR OPERATIONS
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Experimental lost of MEXA Transistors incorporating the following programmed process improvements were fabricated in the engineering laboratory and submitted for reliability evaluation. The subtle epitaxial wafer material problem encountered during the first quarter of performance was corrected by the application of replacement material, i.e., wafers from a subsequent lot of purchased material which precluded channeling. Recurrence of the difficulty is expected to be avoided by qualifying each material shipment prior to production until material confidence has been restored. The evaluation results of Lots A through H incorporating the Isolation Diffusion and Spray Etch process improvements indicate substantial improvement in device reliability. Lots I through M are now being evaluated for reliability results. Author
- Electrical and Electronic Equipment