A STUDY OF THE PROTECTIVE EFFECT OF A THIN FILM ON A SURFACE EXPOSED TO SPUTTERING.
AIR FORCE INST OF TECH WRIGHT-PATTERSON AFB OHIO SCHOOL OF ENGINEERING
Pagination or Media Count:
A serious problem in the design of plasma devices has been the erosion of material surfaces in contact with an energetic plasma. A technique for the protection of surfaces exposed to the destructive effects of sputtering was investigated. The technique involves the coating of a metallic substrate tantalum with a thin protective film of gallium. Although no quantitative measurements of the protective effect were obtained, the existence of the protective effect was definitely established. The effect was found to be substantial at ion energies near the threshold potential. However, the effect was found to have an upper limit near or below 100 ev. This protective effect would have its best application under conditions of high current density and low bombardment energies.
- Coatings, Colorants and Finishes
- Plasma Physics and Magnetohydrodynamics