Accession Number:

AD0633554

Title:

LASER DAMAGE STUDY OF THIN FILMS

Descriptive Note:

Final technical rept. 1 Apr 1965-1 Apr 1966

Corporate Author:

BAUSCH AND LOMB INC ROCHESTER NY RESEARCH AND DEVELOPMENT DIV

Personal Author(s):

Report Date:

1965-04-01

Pagination or Media Count:

83.0

Abstract:

Damage to optical surfaces and materials is often experienced in high intensity laser beams. The threshold values above which this damage occurs are of interest for both optical engineering and theoretical purposes. In the present work energy density thresholds were determined for single quarterwave and halfwave films vacuum evaporated on glass and quartz substrates. Using a 6 microsec. ruby laser pulse films of the following dielectric materials were studied ThF4, MgF2, Al2O3, 5NaF.3AlF3, SiO2, ZrO2, TiO2, CeO2 and ZnS. aluminum and Inconel films were also included. The latter were found to have thresholds around .05 joulessq cm, whereas thresholds for the dielectrics covered the range from 50 down to 0.5 joulessq cm, roughly in the sequence of the preceding listing.

Subject Categories:

  • Radiation and Nuclear Chemistry
  • Lasers and Masers
  • Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE