PHOTOMETALLIC PROCESS INVESTIGATION.
Interim development rept. no. 1, 1 Dec 65-28 Feb 66,
GENERAL ELECTRIC CO SCHENECTADY N Y RESEARCH AND DEVELOPMENT CENTER
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The project has as its ultimate objective the fabrication of microminiature circuits in gold, nichrome, aluminum and silica by a process in which these materials are etched directly by a photosensitive material according to an incident light pattern. Potential light sensitive halogens, sulfides and cyanides have been evaluated in liquid solvents. The capability of such materials as photoetchants has been demonstrated. Such materials as iodoform, N-bromosuccinimide, N,N dibromodimethylhydantoin, N-chlorosuccinimide, ferric chloride and potassium ferrocyanide show the most promise. Thirtyseven compounds were investigated. Nineteen of these were positive etchants for gold. Eight were positive etchants for nichrome. Author
- Electrical and Electronic Equipment
- Fabrication Metallurgy