ANALYSIS AND DESIGN OF A MACHINE-SCAN ELECTRON BEAM DEVICE.
PENNSYLVANIA STATE UNIV UNIVERSITY PARK ORDNANCE RESEARCH LAB
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Electron beams can be used to perform a dual role in the fabrication of microcircuits. An electron source may be pulsed to provide a beam capable of machining materials, or alternately, to provide a low current beam for scanning electron image formation. If the beam is pulsed to high and low intensities at a sufficiently fast rate, it is possible to obtain a continuous picture of a bombarded specimen being machined. This paper presents the results of a study concerned with the design of a machine-scan electron beam device to perform the above operation. Theoretical calculations are coupled with experimental observations in order to design a suitable device, and a performance analysis on this apparatus is presented. The recommendations deal specifically with improvements on the device for further research. Author
- Manufacturing and Industrial Engineering and Control of Production Systems
- Test Facilities, Equipment and Methods