CHEMICALLY DEPOSITED YTTRIUM-IRON-GARNET FILMS.
ARMY ELECTRONICS COMMAND FORT MONMOUTH N J
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Thin films of yttrium-iron-garnet and aluminum substituted yttrium-iron-garnet, ranging in thickness from 0.5 to 38 microns, were prepared by chemical deposition techniques. Major phase, firing temperature, linewidth, thickness and particle size studies were made on these films to determine and control single phase formation and to obtain a minimum ferrimagnetic linewidth for potential microwave applications. Experimental results show that the narrowest linewidth, 125 oersteds, was obtained for the film with the highest degree of major phase structure. It was also found that films with submicron as well as micron particle sizes can also be formed. Author
- Electricity and Magnetism