Accession Number:

AD0628664

Title:

THE PERFORMANCE OF SIO SOURCE (NAFI IF-1008) IN SINGLE-CHAMBER VACUUM SYSTEMS.

Descriptive Note:

Interim technical rept. Nov 64-Mar 65,

Corporate Author:

NAVAL AVIONICS FACILITY INDIANAPOLIS IND

Personal Author(s):

• UNDERWOOD,W. C.

Report Date:

1965-12-13

Pagination or Media Count:

15.0

Abstract:

An evaporation source for deposition of silicon monoxide thin films was reported to possess high raw material capacity and high evaporation rate characteristics. The source design was evaluated in two different laboratory bell jar vacuum systems and was found to be unsatisfactory. Author

Descriptors:

• *DIELECTRIC FILMS
• *VAPOR PLATING
• DEPOSITION
• EVAPORATION
• SILICON COMPOUNDS
• MONOXIDES
• FILMS
• VACUUM

Subject Categories:

• Electrical and Electronic Equipment
• Ceramics, Refractories and Glass
• Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE