Accession Number:

AD0626985

Title:

INTEGRATED SILICON DEVICE TECHNOLOGY. VOLUME X. CHEMICAL/METALLURGICAL PROPERTIES OF SILICON.

Descriptive Note:

Rept. for Oct 64-Oct 65,

Corporate Author:

RESEARCH TRIANGLE INST DURHAM N C

Personal Author(s):

Report Date:

1965-11-01

Pagination or Media Count:

190.0

Abstract:

A complete set of existing silicon binary phase diagrams and a complete listing of known binary silicides, along with some of their properties, are presented in convenient reference form. Reactions of silicon with common reagents are summarized, emphasizing those reactions dominant in the chemical etching and polishing of silicon. A technique for spin-etching silicon wafers is also described. Author

Subject Categories:

  • Inorganic Chemistry
  • Electrical and Electronic Equipment
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE