PHOTOELASTIC STUDIES FOR VEHICLE MOBILITY RESEARCH
OHIO RIVER DIV LABS CINCINNATI
Pagination or Media Count:
The test procedures and techniques developed in the studies reported herein provide a means of obtaining photoelastic stress patterns for moving wheel loads at controlled degrees of slip. Sufficient information was developed to compute normal and shear stress distribution on planes in the gelatin foundation within one-fourth inch of the contact surface between the moving wheel load and gelatin, if certain approximations are made. Further study is indicated to accurately define the stress at a point. Concerning the action of the static and moving wheel loads on the gelatin model, it was found that there was an increase in maximum shear stress for the moving wheel load at 0, 25 and 50 slip over that of an equivalent static wheel load. This increase in maximum shear stress was due to a redistribution of normal stress at the wheel contact with the gelatin. Also, the maximum shear stress under the action of the moving wheel load was greater at 0 slip than at 25 and 50 slip.