Accession Number:
AD0619421
Title:
INVESTIGATION OF HIGH POWER GASEOUS ELECTRONICS.
Descriptive Note:
Quarterly progress rept. no. 10, 16 Feb-15 May 65,
Corporate Author:
MICROWAVE ASSOCIATES INC BURLINGTON MASS
Personal Author(s):
Report Date:
1965-05-15
Pagination or Media Count:
32.0
Abstract:
Gas clean-up was investigated in an X-band TR tube over a 20 to 300C temperature range. An Arrhenius plot of chemisorption of water vapor in the bronze walls and brazing solder yielded an energy of activation of 6.0 kcalmole. Negligible clean-up occurred in a 1 watt RF discharge was independent of ambient temperature. Maximum clean-up of water vapor occurred at 20C for a 10 watt RF discharge at a 7070 glass-kovar window. An energy of activation of 6.0 kcalmole for clean-up at the window was measured. Diffusion controlling mechanisms were indicated because of the dependence of clean-up and chemisorption on the square root of time. Discharges in gas mixtures containing ammonia caused evolution of gas due to reduction of oxides formed in the water vapor discharges. Author