Accession Number:

AD0617835

Title:

RECENT ADVANCES IN DYNAMIC PHOTOELASTICITY,

Descriptive Note:

Corporate Author:

FRANKFORD ARSENAL PHILADELPHIA PA PITMAN-DUNN RESEARCH LABS

Personal Author(s):

Report Date:

1964-01-01

Pagination or Media Count:

8.0

Abstract:

The application of photoelasticity to dynamic stress analysis generally involves the use of high-speed photography. The equipment and techniques which were developed for studying transient stresses in low modulus photoelastic materials are reviewed briefly. The emphasis of the paper is on the use of a special dual-beam polariscope for obtaining simultaneous normal and oblique incidence stress patterns in conjunction with a highspeed framing camera, to study stress wave propagation in high modulus photoelastic materials subjected to explosive loads. Dynamic stress patterns were photographed at speeds up to 720,000 frames per second, using flash tubes and filters to obtain monochromatic light. The procedures are described and typical results are given. Author

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE