Accession Number:

AD0614779

Title:

THIN-FILM PREPARATION

Descriptive Note:

Technical rept.

Corporate Author:

ARMY ELECTRONICS COMMAND FORT MONMOUTH NJ

Personal Author(s):

Report Date:

1965-02-01

Pagination or Media Count:

27.0

Abstract:

Vacuum deposition techniques for the preparation of thin films were investigated and developed to a point where a study of the usefulness of these structures as tunnel emitters is now feasible. Experimentation with Al-ZnS-Al, Mg-MgO-Mg, and Al-Al2O3-Al structures will eventually lead to a study of the combination Al-A1203-Au sandwich, with special attention given to the method of forming the oxide film and to the geometry of the structure. A method of monitoring the thickness of thin films during deposition by means of an oscillating quartz crystal was investigated. Although the results proved promising, a decision on the final capabilities of this method cannot be made until calibration tests are completed and the reproducibility of the results is established. The usefulness of the electrolytical anodic oxidation technique for the preparation of thin insulating oxide layers was investigated. Preliminary experiments were conducted on various sheet metals. The investigation is presently concentrated on the oxidation of vacuum-deposited films of aluminum and the formation of special patterns using photoresist masking techniques.

Subject Categories:

  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE