STUDY OF THIN FILM COMPOUNDS FORMED FROM SIMULTANEOUSLY EVAPORATED CONSTITUENTS.
Final rept. for 1 Jun 63-31 Jan 65,
GENERAL TELEPHONE AND ELECTRONICS LABS INC BAYSIDE N Y
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Thin films of lead titanate suitable for forming thinfilm capacitors have been prepared by the simultaneous evaporation of lead and titanium oxides in an oxygen atmosphere. The experimental conditions for deposition of the films on silicon substrates have been established for obtaining virtually a 100 percent yield of films with a specific capacitance greater than 1 micro Fsq cm, dielectric constants in the range from 200 to 400, and a dissipation factor less than 10 percent. This high reproducibility derives from an improved understanding and control of the vapor-phase oxidation of titanium and of the interactions between the dielectric film and the metal electrodes. The current procedure for synthesis of the lead titanate films is given in detail. An Appendix provides a survey of the literature on previous work on highdielectric-constant films with the perovskite structure. Author