Accession Number:

AD0613563

Title:

CHEMICAL FORMATION OF MICROCIRCUIT ELEMENTS.

Descriptive Note:

Final rept. for 28 Jan 63-30 Nov 64,

Corporate Author:

WESTON INSTRUMENTS INC NEWARK N J

Personal Author(s):

Report Date:

1965-03-01

Pagination or Media Count:

106.0

Abstract:

The reactive sputtering technique was applied to form films of titanium and titanium oxide with a wide range of resistivities. Low resistance metallic films and insulating oxide films are found to be suitable for resistor and capacitor microcircuit elements respectively. Dielectric constants of over 100, and reasonably low dissipation factors have been achieved. Data furnished include frequency dependence of capacitor cza,txteristics, voltage breakdown, long term stability of resistor and capacitor elements, temperature coefficients and some basic film properties. The feasibility of using titanium-titanium oxide film contact for rectification is demonstrated. High static rectification ratios are obtained. Author

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE