HIGH-VACUUM ION SOURCE,
FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO
Pagination or Media Count:
A high-vacuum ion source based on the extraction of an ion flow from the region of the electron beam of high density is described. Under a residual gas pressure of 2.0001 mm Hg and an extracting voltage of V -400v, ion currents of 80 microamps are obtained. Usually in ion sources in which sufficiently large ion densities can be found, the ion beam is extracted from the plasma of a gas discharge. In the known sources, which work under small gas pressures, the effect of the magnetic field is used, which increases the number of collisions. In this device the electric field is the only effect, and the necessary ionization is ensured by the high density of electrons in the beam.