The current emphasis in the area of materials research is on semiconducting and dielectric films for hightemperature application. Semiconducting and dielectric films are being deposited by thermal evaporation in vacuum, using resistance heating or electron-beam bombardment. The characterization of the neodymium oxide-thin dielectric film system was completed, and effort was directed toward finding another dielectric film system having not only the high-temperature electrical stability of the neodymium oxide system but also the physical stability at high temperatures which the latter system lacks. Intensive work on field-effect devices for hightemperature circuit application continues. Temperature data on cadmium selenide field-effect devices are being gathered for use in the design of the operational amplifier. Radiation-resistance studies are being conducted in accordance with the contractual requirements.