Accession Number:

AD0605294

Title:

THICKNESS AND COMPOSITION OF VACUUM-DEPOSITED NICKEL-CHROMIUM FILMS,

Descriptive Note:

Corporate Author:

ARMY ELECTRONICS LABS FORT MONMOUTH N J

Report Date:

1964-03-01

Pagination or Media Count:

12.0

Abstract:

Thin films of nickel-chromium were deposited on planar glass substrates by vacuum evaporation of the alloy Nichrome V with a nominal bulk composition Ni 80 - Cr 20. The nickel-chromium ratio of deposited films was determined by chemical microanalysis using spectrophotometric methods, the thickness by optical interferometry. The interdependencies of thickness, composition ratio, sheet resistivity, temperature coefficient of resistance, film density, and other film parameters were investigated or derived and the interrelations of these variables are discussed. It is shown quantitatively how-under constant evaporation and deposition conditions-the nickel-chromium composition ratio varies with the sheet resistivity and how, on the other hand, the sheet resistivity varies with the thickness of these films. Author

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE